Research Facilities
Semiconductor Processing Facilities
|
· FE-type Electron beam
lithography system (100kV) · Inductively coupled plasma etching
system (HI, Cl-base) · Inductively coupled plasma
etching system (F-base) · Atomic layer deposition · Magnetron sputter · Evaporator · Flash lamp anneal system |
·
Thermal oxidation heater ·
Draft chambers ·
Ultra-pure water generation system ·
Compact metal coater ·
Spin coater ·
Wafer scriber |
Semiconductor Evaluation Facilities
|
·
FE-type scanning electron microscope ·
Energy dispersion spectroscopy system ·
Spectroscopic ellipsometer ·
Time resolved spectroscopy system ·
Photoluminescence measurement system |
·
Laser microscope ·
Fluorescence optical microscope ·
Thermal view microscope · Optical microscope |
Device Characterization Facilities
|
·
Semiconductor laser micro-probing system ·
Nano-waveguide evaluation system ·
Infrared InGaAs cameras (including SXGA) ·
Optical network analyzer ·
Optical spectrum analyzers · Ultra-wideband tunable
laser · Tunable lasers with filter
mode · Optical amplifiers for C,L,O bands · Optical sampling
oscilloscope up to 2ps · O/E converter 65GHz, 30GHz,
20GHz · Polarimiter · Polarization controllers |
·
PPG at 40G, 32G, 25G ·
MUX, RF amplifiers 50GHz ·
Network analyzer 40GHz, 100MHz ·
Sampling oscilloscope 50GHz ·
Real time oscilloscope 12GHz ·
AWG 60GS/s ·
CW and pulsed YAG lasers ·
High power cw blue/ultraviolet
lasers ·
Picosecond mode-locked semiconductor lasers ·
Active/passive mode-locked fiber laser ·
Auto-correlator / cross-correlator ·
LCOS filter (including dispersion control) |
Computer System
|
·
CAD system for circuit pattern drawing · Photonic band analysis
software · FDTD analysis software ·
FEM analysis software |
·
Cluster computer system with 100 nodes ·
Personal computers and work stations ·
Image analyzer system |
